发明名称 Keyway alignment substrates
摘要 The vacuum hold down alignment substrate is formed as an array of precisely aligned alignment substrate subunits. Each subunit is formed with an alignment pattern formed in a photo-patternable or electroformable material. When the plurality of alignment substrate subunits are formed into an array to produce the alignment substrate, the alignment patterns are aligned to receive corresponding patterns in discrete subunit devices which are aligned into an array on the alignment substrate.
申请公布号 US4975143(A) 申请公布日期 1990.12.04
申请号 US19890440211 申请日期 1989.11.22
申请人 XEROX CORPORATION 发明人 DRAKE, DONALD J.;CAMPANELLI, MICHAEL R.;TELLIER, THOMAS A.
分类号 B41J2/05;H01L21/68;H01L31/02;H04N1/028 主分类号 B41J2/05
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