发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 A photosensitive resin compsn. is prepd. by mixing a naphthoquinone diazide cpd. and a novolac resin by the condsn. of cresol and formaldehyde with 0.3-10 wt.% cpd. of formula (I) and 0.3-8 wt.% cpd. of formula of (II) as an additive for improving a photosensitivity and preventing an oxidation. In the formulas, R1 is H or methyl; R2 is H or OH; R3, R4 and R5 are each H, OH, methoxy or sulfoxy; R6, R7, R8, R9 are each H, methoxy or C1-5 alkyl. The compsn. is used for forming a positive image by coating a pre-sensitized aluminium plate, and has a good sensitivity and durability.
申请公布号 KR910004910(B1) 申请公布日期 1991.07.15
申请号 KR19880014284 申请日期 1988.10.31
申请人 CHEIL SYNTHETIC IND.CO.,LTD. 发明人 KIM KWANG-TAE;KIM JONG-RAK;KIM DAE-JIN;SHIN SONG-HO
分类号 G03F7/022;(IPC1-7):G03F7/022 主分类号 G03F7/022
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