发明名称 MASK FILM
摘要 The light shielding mask film is produced by coating a pressure-sensitive adhesive layer and a light-shielding mask layer on the polyester resin substrate in order. The adhesive layer contains 100 wt.% pressure-sensitive adhesive and 0.001-1.0 wt.% organic release agent, and the mask layer contains 100 wt.% mask layer resin and 0.1-10 wt.% inorganic release agent. The organic release agent is pref. wax, paraffin, polysiloxane or fluoroalkyl deriv., and the inorganic release agent is pref. aluminium oxide, silicon oxide, titanium oxide or calcium oxide.
申请公布号 KR910004912(B1) 申请公布日期 1991.07.15
申请号 KR19880018187 申请日期 1988.12.31
申请人 KOLON CO.,LTD. 发明人 KIM CHUNG-BU;CHON TAE-IL;CHON WOO-WANG
分类号 G03F7/00;(IPC1-7):G03F7/00 主分类号 G03F7/00
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