发明名称 |
SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING THIN FILM |
摘要 |
<p>To provide a substrate treatment apparatus capable of suppressing adherence of dust to a film coated on a substrate. As an aspect of the present invention is a substrate treatment apparatus provided with a spin-coating treatment chamber 4a for coating a film on the substrate by spin-coating, a first air-conditioning mechanism that regulates an amount of dust in the air in the spin-coating treatment chamber, an annealing treatment chamber 7a for performing lamp annealing treatment on the film coated on the substrate, a conveying chamber 2a that is connected to each of the spin-coating treatment chamber and the annealing treatment chamber and is for conveying the substrate between the spin-coating treatment chamber and the annealing treatment chamber each other, and a second air-conditioning mechanism that regulate an amount of dust in the air in the conveying chamber.</p> |
申请公布号 |
EP2565910(A4) |
申请公布日期 |
2014.01.15 |
申请号 |
EP20100850746 |
申请日期 |
2010.04.28 |
申请人 |
YOUTEC CO., LTD. |
发明人 |
SUZUKI, MITSUHIRO;KIJIMA, TAKESHI;HONDA, YUUJI |
分类号 |
H01L21/31;B05C11/08;B05C15/00;B05D1/40;B05D3/00;H01L21/02;H01L21/67 |
主分类号 |
H01L21/31 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|