| 发明名称 |
IODATE-CONTAINING CHEMICAL-MECHANICAL POLISHING COMPOSITIONS AND METHODS |
| 摘要 |
<p>THE INVENTION PROVIDES COMPOSITIONS AND METHODS FOR PLANARIZING OR POLISHING A SUBSTRATE. THE COMPOSITION COMPRISES AN ABRASIVE, IODATE ION, A NITROGEN-CONTAINING COMPOUND SELECTED FROM THE GROUP CONSISTING OF A NITROGEN-CONTAINING C?-?? HETEROCYCLE AND A C?-?? ALKYLAMINE, AND A LIQUID CARRIER COMPRISING WATER.</p> |
| 申请公布号 |
MY150410(A) |
申请公布日期 |
2014.01.15 |
| 申请号 |
MY2008PI03710 |
申请日期 |
2007.03.06 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
LI, SHOUTIAN;CARTER, PHILLIP;ZHANG, JIAN |
| 分类号 |
C09G1/02 |
主分类号 |
C09G1/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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