Gas field ion source for multiple applications

摘要

A focused ion beam device (100) is described. The device includes an ion beam column (16) including an enclosure for housing (14) an emitter with an emitter area (12) for generating ions, a first gas inlet (110) adapted to introduce a first gas to the emitter area, a second gas inlet (112) adapted to introduce a second gas different from the first gas to the emitter area, and a switching unit adapted to switch between introducing the first gas and introducing the second gas.