| 摘要 |
PROBLEM TO BE SOLVED: To measure the vapor-deposited flux in the x-direction orthogonal to the y-direction by the atomic absorption method without polluting a light source or a light receiving device with a film deposition material when executing the film deposition by vapor deposition while conveying a substrate in the y-direction. SOLUTION: Measuring light is made to pass in the x-direction orthogonal to the y-direction. The passing position of the measuring light in the x-direction with respect to the vapor-deposited flux not shielded by a shielding plate is changed by relatively moving the optical path of the measuring light to the shielding plate by using the shielding plate to shield the vapor-deposited flux arranged on the evaporation source side from the optical path of the measuring light. COPYRIGHT: (C)2012,JPO&INPIT |
