发明名称 |
Vapor deposition device and vapor deposition method |
摘要 |
A vapor deposition device (50) includes a mask (60) having periodic patterns, and only a region of the mask (60) where a one-period pattern is formed is exposed. A length of the mask base material along a direction perpendicular to a long-side direction of the mask base material is shorter than a length of a film formation substrate (200) along a direction of scanning of the film formation substrate (200). The mask (60) is provided so that the long-side direction of the mask base material is perpendicular to the direction of scanning and that the exposed region is allowed to move in a direction perpendicular to the direction of scanning by rotation of a wind-off roll (91) and a wind-up roll (92). |
申请公布号 |
US8628620(B2) |
申请公布日期 |
2014.01.14 |
申请号 |
US201113977645 |
申请日期 |
2011.12.28 |
申请人 |
KAWATO SHINICHI;HAYASHI NOBUHIRO;SONODA TOHRU;INOUE SATOSHI;SHARP KABUSHIKI KAISHA |
发明人 |
KAWATO SHINICHI;HAYASHI NOBUHIRO;SONODA TOHRU;INOUE SATOSHI |
分类号 |
C23C16/04;C23C14/00;C23C14/22;C23C14/24;C23C16/00 |
主分类号 |
C23C16/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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