发明名称 |
Manufacturing method for thin film battery |
摘要 |
A thin film battery manufacturing method is provided for deposition of lithium metal oxide films onto a battery substrate. The films are deposited in a sputtering chamber having a plurality of sputtering targets and magnetrons. The sputtering gas is energized by applying a voltage bias between a pair of the sputtering targets at a frequency of between about 10 and about 100 kHz. The method can provide a deposition rate of lithium cobalt oxide of between about 0.2 and about 4 microns/hr with improved film quality. |
申请公布号 |
US8628645(B2) |
申请公布日期 |
2014.01.14 |
申请号 |
US20070849959 |
申请日期 |
2007.09.04 |
申请人 |
WANG WENG-CHUNG;NIEH KAI-WEI;FRONT EDGE TECHNOLOGY, INC. |
发明人 |
WANG WENG-CHUNG;NIEH KAI-WEI |
分类号 |
C23C14/00;C23C14/32;C25B9/00;C25B11/00;C25B13/00 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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