发明名称 Charged particle beam device and method for correcting position with respect to charged particle beam
摘要 An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the deflection direction of the charged particle beam is not parallel to the tilt axis of the specimen, the deflection rotation angle to the observation direction of the charged particle beam is determined, and the deflection pattern is changed. Thereby the distortion in the image is corrected. The deflection pattern is changed to a parallelogram. A distortion-free image is obtained even if the specimen is tilted, and the specimen can be observed and processed with high accuracy. This allows automatically recognizing the position correction mark to perform observation and processing after correcting the positional relation.
申请公布号 US8629394(B2) 申请公布日期 2014.01.14
申请号 US200913202498 申请日期 2009.10.23
申请人 MADOKORO YUICHI;AIZAWA MEGUMI;YOSHIZAWA YUKIO;HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 MADOKORO YUICHI;AIZAWA MEGUMI;YOSHIZAWA YUKIO
分类号 G01N31/00;G01N33/00 主分类号 G01N31/00
代理机构 代理人
主权项
地址