发明名称 RAW MATERIAL GAS SUPPLY DEVICE FOR SEMICONDUCTOR MANUFACTURING DEVICE
摘要 A raw material gas supply apparatus includes a liquid raw material gas supply source, a source tank storing liquid raw material, a gas distribution passage through which raw material gas comprising steam of the liquid raw material is supplied to a process chamber from the source tank, an automatic pressure regulator installed on an upstream side of the gas passage, wherein the automatic pressure regulator keeps supply pressure of the raw material gas at a set value, a supply gas switching valve installed on a downstream side of the gas passage, wherein this valve opens and closes the gas passage, an orifice provided on at least one of an inlet side or outlet side of the valve, wherein the orifice regulates flow rate of the raw material gas, and a constant temperature heating device heats the source tank, the gas passage, the valve and the orifice to a set temperature.
申请公布号 KR20140005314(A) 申请公布日期 2014.01.14
申请号 KR20137028656 申请日期 2012.04.25
申请人 FUJIKIN INC. 发明人 NAGASE MASAAKI;HIDAKA ATSUSHI;HIRATA KAORU;DOHI RYOUSUKE;NISHINO KOUJI;IKEDA NOBUKAZU
分类号 C23C16/448;H01L21/31 主分类号 C23C16/448
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