发明名称 |
Titanium-doped indium oxide films |
摘要 |
An apparatus and methods of forming the apparatus include a film of transparent conductive titanium-doped indium oxide for use in a variety of configurations and systems. The film of transparent conductive titanium-doped indium oxide may be structured as one or more monolayers. The film of transparent conductive titanium-doped indium oxide may be formed using atomic layer deposition. |
申请公布号 |
US8628615(B2) |
申请公布日期 |
2014.01.14 |
申请号 |
US201213615906 |
申请日期 |
2012.09.14 |
申请人 |
AHN KIE Y.;FORBES LEONARD;MICRON TECHNOLOGY, INC. |
发明人 |
AHN KIE Y.;FORBES LEONARD |
分类号 |
C30B23/02 |
主分类号 |
C30B23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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