发明名称 METHOD AND APPARATUS FOR PROCESSING SUBSTRATE
摘要 According to the present invention, an apparatus for processing a substrate includes a substrate support member; and a movable injection member supplying a fluid onto a substrate placed on the substrate support member. The movable injection member includes a first nozzle arm rotating to inject at least one fluid; and a second nozzle arm rotating with a driving source and a separate rotation shaft on the first nozzle arm to inject at least one fluid.
申请公布号 KR20140003988(A) 申请公布日期 2014.01.10
申请号 KR20120110148 申请日期 2012.10.04
申请人 SEMES CO., LTD. 发明人 LEE, TAEK YOUB
分类号 H01L21/302 主分类号 H01L21/302
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