| 摘要 |
The method involves defining an image of a scene, where the image comprises grayscale pixels. A pixel matrix is formed, where each pixel in the matrix comprises a central area having a surface area. Lithography is performed for an opaque layer at a surface of a wafer according to a pattern defined by the pixel matrix. The lithography is performed to remove the opaque layer in an inner side of the central area if an equivalent pixel of another matrix is of a first shade and to remove opaque layer in an outer side of the central area if equivalent pixel of the latter matrix is of a second shade. |
