发明名称 RADIATION SENSITIVE RESIN COMPOSITION AND FORMATION OF RESIST PATTERN USING THE SAME
摘要 PURPOSE: To obtain a radiation sensitive resin compsn. with which easy processing of high melting metals is made possible and the simplification of production stages is made possible by incorporating a specified compd. therein. CONSTITUTION: This radiation sensitive resin compsn. contains poly(titanoxane) having R-O-Ti bonds (R denotes an alkyl group) at every monomer unit and an acid generating agent which is decomposed to generate an acid by the effect of radiation. The poly(titanoxane) contained in the radiation sensitive resin compsn. forms silanol by catalytic reaction with the acid, thereby forming an inorg. polymer having much titanic acid. The resulted inorg. polymer having much titanic acid gelated and does not dissolve in a solvent any more. The parts where the silanol is formed by the acid generated from the acid generating agent do not dissolve in a developer and the parts which do not react with the acid dissolve in the developer and, therefore, the compsn. is usable as a material for resift patterns.
申请公布号 JPH08328255(A) 申请公布日期 1996.12.13
申请号 JP19950131363 申请日期 1995.05.30
申请人 OKI ELECTRIC IND CO LTD 发明人 ITO TOSHIO
分类号 G03F7/004;C08L85/00;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/004
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