发明名称 Semiconductor Device and Fabrication Method Thereof
摘要 A p channel TFT of a driving circuit has a single drain structure and its n channel TFT, an LDD structure. A pixel TFT has the LDD structure. A pixel electrode disposed in a pixel unit is connected to the pixel TFT through a hole bored in at least a protective insulation film formed of an inorganic insulating material and formed above a gate electrode of the pixel TFT, and in an inter-layer insulation film disposed on the insulation film in close contact therewith. These process steps use 6 to 8 photo-masks.
申请公布号 US2014011331(A1) 申请公布日期 2014.01.09
申请号 US201314021168 申请日期 2013.09.09
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;ARAI YASUYUKI;KOYAMA JUN
分类号 H01L29/66;G02F1/1362;H01L21/77;H01L21/84;H01L27/12 主分类号 H01L29/66
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