PHOTOSENSITIVE RESIN COMPOSITION AND INSULATING FILM USING THE SAME

摘要

The present invention relates to a photosensitive resin composition and an insulating film using the same. The photosensitive resin composition of the present invention comprises: a compound (1) which includes a repeating unit represented by chemical formula 1; a random copolymer (2) which includes a building unit (2-1) induced from ethylenically unsaturated carboxylic acid, ethylenically unsaturated carboxylic acid anhydride, and a mixture thereof, and a building unit (2-2) induced from an ethylenically unsaturated compound containing an aromatic ring; a polymerizable unsaturated compound (3); and a photopolymerization initiator (4) and is able to be usefully used in the manufacture of an insulation film for a liquid crystal display since the photosensitive resin composition is able to provide a hardened film having the high remaining rate of a membrane while having properties such as excellent chemical resistance, adhesiveness and the likes.