| 摘要 |
PROBLEM TO BE SOLVED: To provide a new vapor deposition film having an inorganic oxide vapor deposition film which has pores finer than conventional inorganic oxide vapor deposition films, and has improved gas barrier characteristics for oxygen gas and water vapor, and to provide a method of manufacturing the same.SOLUTION: A vapor deposition film comprises a plastic film substrate and one or more layers of inorganic oxide vapor deposition films laminated on the substrate. Pores formed in the inorganic oxide vapor deposition film have a maximum diameter of 0.5 nm or smaller. |
