发明名称 GaN SINGLE CRYSTAL SUBSTRATE AND METHOD OF MANUFACTURING THE SAME, AND GaN-BASED SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a GaN single crystal substrate which has a large diameter and in which surface orientation of a principal surface has a value other than (0001) and (000-1) and dislocation density within the principal surface is substantially uniform, and a method of manufacturing the substrate.SOLUTION: In the GaN single crystal substrate 20p, an area of a principal surface 20pm is 10 cmor more, surface orientation of the principal surface 20pm is inclined by 65° or more and 85° or less to a (0001) surface or a (000-1) surface 20c, and distribution of dislocation density within the principal surface 20pm is substantially uniform, that is, dispersion of dislocation density to average dislocation density within the principal surface 20pm is within ±100%, for example.
申请公布号 JP2014001137(A) 申请公布日期 2014.01.09
申请号 JP20130198583 申请日期 2013.09.25
申请人 SUMITOMO ELECTRIC IND LTD 发明人 FUJIWARA SHINSUKE;UEMATSU KOJI;OSADA HIDEKI;NAKAHATA SEIJI
分类号 C30B29/38;C30B25/20;H01L21/205 主分类号 C30B29/38
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