发明名称 SEMICONDUCTOR LASER AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To prevent uneveness and decrease in an optical output on a crystal surface of a semiconductor laser.SOLUTION: A semiconductor laser comprises: a ridge 5 in which a p-type InP clad layer 3 and an n-type InP clad layer 4 sandwich an active layer 2, on a p-type InP substrate 1; current block layers 6 which bury both lateral faces of the ridge 5; and an n-type InP contact layer 7 provided on the ridge 5 and the current block layers 6. The current block layer 6 includes a p-type InP layer 8, an n-type InP layer or a hole trap semi-insulating semiconductor layer 9, a p-type InP layer 10, an undoped InP layer 11 and a highly-doped p-type InP layer 12 which are stacked in this order from the p-type InP substrate 1 side. The n-type InP contact layer 7 includes a p-type inversion region 13 in which a dopant of the highly-doped p-type InP layer 12 is diffused at a part in contact with the highly-doped p-type InP layer 12. The undoped InP layer 11 is composed of undoped InP or semi-insulating InP and inhibits the dopant of the highly-doped p-type InP layer 12 from being diffused to the active layer 2.
申请公布号 JP2014003089(A) 申请公布日期 2014.01.09
申请号 JP20120136130 申请日期 2012.06.15
申请人 MITSUBISHI ELECTRIC CORP 发明人 NAKAMURA NAOMIKI
分类号 H01S5/227 主分类号 H01S5/227
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