TOOL FOR USE WITH DUAL-SIDED CHEMICAL MECHANICAL PLANARIZATION PAD CONDITIONER

摘要

A tool includes a holder configured to couple to a dual-sided chemical mechanical planarization (CMP) pad conditioner. The holder has a magnetic material, a first magnetic field strength (H1) at a first face, and a second magnetic field strength (H2) at a second face opposite the first face. The first magnetic field strength (H1) is different than the second magnetic field strength (H2).