发明名称 EPITAXIAL STRUCTURE AND EPITAXIAL GROWTH METHOD FOR FORMING EPITAXIAL LAYER WITH CAVITIES
摘要 An epitaxial growth method includes the steps of: providing a substrate; forming a sacrifice layer on the substrate; patterning the sacrifice layer to form a plurality of bumps spaced apart from each other on the substrate; epitaxially forming a first epitaxial layer on the substrate to cover a portion of each of the bumps; removing the bumps to form a plurality of cavities; and epitaxially forming a second epitaxial layer on the first epitaxial layer such that the cavities are enclosed by the first epitaxial layer and the second epitaxial layer. An epitaxial structure grown by the method is disclosed as well.
申请公布号 US2014008766(A1) 申请公布日期 2014.01.09
申请号 US201313932665 申请日期 2013.07.01
申请人 LEXTAR ELECTRONICS CORPORATION 发明人 CHEN JUN-RONG;CHOU HSIU-MEI;YE JHAO-CHENG
分类号 H01L33/02 主分类号 H01L33/02
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