| 发明名称 |
A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A NON-IONIC SURFACTANT AND A CARBONATE SALT |
| 摘要 |
A chemical mechanical polishing (CMP) composition (Q) comprising (A) Inorganic particles, organic particles, or a mixture or composite thereof, wherein the particles are cocoon-shaped (B) a non-ionic surfactant, (C) a carbonate or hydrogen carbonate salt, (D) an alcohol, and (M) an aqueous medium. |
| 申请公布号 |
WO2014006526(A2) |
申请公布日期 |
2014.01.09 |
| 申请号 |
WO2013IB55102 |
申请日期 |
2013.06.21 |
| 申请人 |
BASF SE;BASF SCHWEIZ AG;BASF (CHINA) COMPANY LIMITED |
发明人 |
REICHARDT, ROBERT;LAUTER, MICHAEL;CHIU, WEI LAN WILLIAM;LI, YUZHUO |
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