发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high sensitivity and excellent insulating property and storage stability.SOLUTION: The photosensitive resin composition comprises: (A) a polymer component including a polymer satisfying at least one of the following conditions (1) and (2); (B) an ionic photo-acid generator; (C) a compound expressed by general formula (S) (in the formula, Rrepresents a group having at least one nitrogen atom, A represents a divalent linking group, and Rrepresents an organic group); a solvent; and an alkoxysilane compound. The conditions are: (1) a polymer having (a1) a structural unit having a group in which an acid group is protected by an acid decomposable group, and (a2) a structural unit having a crosslinking group; and (2) a polymer having (a1) a structural unit having a group in which an acid group is protected by an acid decomposable group, and a polymer having (a2) a structural unit having a crosslinking group.
申请公布号 JP2014002316(A) 申请公布日期 2014.01.09
申请号 JP20120138945 申请日期 2012.06.20
申请人 FUJIFILM CORP 发明人 YAMAZAKI KENTA;HIKITA MASANORI;SHIMOYAMA TATSUYA;YAMADA SATORU;KAWASHIMA TAKASHI;YONEZAWA HIROYUKI
分类号 G03F7/004;C08F20/10;G03F7/039;G03F7/075;H01L21/027 主分类号 G03F7/004
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