| 摘要 |
The invention relates to a plasma coating device (10) and a method for homogenous coating of a substrate (12). It comprises a particle reservoir (14), a dosing device (16) for dosing the particles (15) contained in the particle reservoir (14), a processing chamber (20) and a transport line (18) to convey particles (15) into the processing chamber (20). The processing chamber pressure (P1) in the processing chamber (20) is lower than the particle reservoir pressure (P2) in the particle reservoir (14). |
