| 摘要 |
<p>When a plurality of vapor deposition material holders are placed on a rotary support and the vapor deposition material held in a specific vapor deposition material holder is heated and vaporized, the present invention prevents the vapor deposition material from coming into the vapor deposition materials held in the other vapor deposition material holders. A plurality of vapor deposition material holders (3) in each of which a vapor deposition material (T) is held in a recessed part that is open at the upper end are disposed on a rotatable rotary support (10), and a specific vapor deposition material holder is led to a heating position to heat and vaporize the vapor deposition material within the specific vapor deposition material holder in such a manner that a deposition-preventing member (20) having an opening (21) for exposing a vapor deposition material holder led to the beam irradiation position is disposed over the rotary support so as to cover the upper ends of the other vapor deposition material holders and that the open upper end of the vapor deposition material holder led to the beam irradiation position is positioned above the lower surface of the deposition-preventing member which surrounds the periphery of the opening.</p> |
