发明名称 SUPERLATTICE STRUCTURE, SEMICONDUCTOR ELEMENT INCLUDING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a superlattice structure, a semiconductor element including the same, and a method of manufacturing the semiconductor element.SOLUTION: Provided are a superlattice structure, and a semiconductor element including the same. The superlattice structure includes a plurality of pairs of layers consisting of repeatedly stacked two or more pairs, where each pair consists of an upper and a lower layer made of materials different from each other, the two layers in each pair have the same thickness, and each of the plurality of pairs has a different total thickness than the other pairs.
申请公布号 JP2014003296(A) 申请公布日期 2014.01.09
申请号 JP20130125380 申请日期 2013.06.14
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 LIM DAE-HO;KIN CHUSEI;KIM JAE KYOON;TAK YOUNG-JO
分类号 H01L21/20;H01L21/205;H01L33/32 主分类号 H01L21/20
代理机构 代理人
主权项
地址