| 摘要 |
PROBLEM TO BE SOLVED: To ensure high sensitivity and high resolving power and to form a superior resist pattern by incorporating a specified soluble resin and a specified compd. generating sulfuric acid when irradiated with active light or radiation. SOLUTION: This positive resist compsn. contains an alkali-soluble resin having crosslinking bonds and groups which are decomposed by the action of an acid and increase solubility in an alkali developer and a compd. represented by formula I or II and generating sulfuric acid when irradiated with active light or radiation. In the formulae I, II, each of R1 -R5 , is H, alkyl, cycloalkyl, etc., and X-is an anion of benzenesulfonic acid, naphthalenesulfonic acid or anthracenesulfonic acid having one of branched or cyclic >=8C alkyl and alkoxy groups, two of straight chain, branched or cyclic 4-7C alkyl and alkoxy groups or three of straight chain or branched 1-3C alkyl and alkoxy groups. |
