发明名称 POLYMER COMPOSITION AND PRODUCTION OF ITS POLYMER
摘要 PROBLEM TO BE SOLVED: To form a pattern with light by using a polymer having a specified structure and unsatd. ester groups as substituents provided with photosensitivity. SOLUTION: This polymer compsn. contains a polymer contg. at least several monomeric repeating units each having a substituent provided with photosensitivity and capable of crosslinking or chain extension of the polymer when the polymer is exposed to chemical rays. The polymer has a structure represented by the formula and the substituent is an unsatd. ester group. In the formula, (x) is 0 or 1, (n) is an integer showing the number of repeating monomeric units and each of A and B is a specified structure. A layer contg. the polymer is formed on a lower substrate with an array of heating elements and address electrodes with terminals formed on the array and the polymer is stuck on the surface of the substrate with the heating elements and the address electrodes on the elements. Desired mechanical and adhesive characteristics are ensured.
申请公布号 JPH1090894(A) 申请公布日期 1998.04.10
申请号 JP19970233812 申请日期 1997.08.29
申请人 XEROX CORP 发明人 TIMOTHY J FULLER;RAM S NARAN;SMITH THOMAS W;LUCA DAVID J;CRANDALL RAYMOND K
分类号 B41J2/16;C08G65/40;C08G65/48;C08G75/23;C08L71/00;C08L71/10;G03F7/038;H01L21/027;(IPC1-7):G03F7/038 主分类号 B41J2/16
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