发明名称 MAGNETIC FIELD GENERATION DEVICE FOR MAGNETRON SPUTTERING
摘要 A racetrack-shaped magnetic-field-generating apparatus for magnetron sputtering comprising a linear portion and corner portions, the linear portion comprising a magnetic base, a center permanent magnet disposed on its surface, and side permanent magnets disposed on both sides thereof with a gap; the center and side permanent magnets being vertically magnetized with opposite polarities; the corner portions comprising a non-magnetic base, a center magnetic pole member disposed on its surface, a semicircular or semi-polygonal, peripheral magnetic pole member, and plural permanent magnets arranged between both magnetic pole members with their magnetization directions in parallel to a target surface; and the magnetic poles of plural permanent magnets opposing the center magnetic pole member having the same polarity as those of the center permanent magnet opposing the target.
申请公布号 KR20140003570(A) 申请公布日期 2014.01.09
申请号 KR20137022317 申请日期 2012.01.12
申请人 HITACHI METALS, LTD. 发明人 KURIYAMA YOSHIHIKO;MITA MASAHIRO
分类号 C23C14/35;H05H1/46 主分类号 C23C14/35
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