| 摘要 |
PROBLEM TO BE SOLVED: To form a hydroxyapatite thin film on various substrates while controlling crystallinity.SOLUTION: In a first step S101, a substrate 101 is heated to a predetermined temperature. The substrate 101 may be, for example, a silicon substrate. Then, in a second step S102, a hydroxyapatite thin film 102 is formed on the substrate 101 heated to the predetermined temperature by a spatter method using a target made of a hydroxyapatite sintered compact and spatter gas containing HO. Here, the predetermined temperature is a temperature at which the hydroxyapatite thin film 102 formed on the substrate 101 in the second step is crystallized. |
