发明名称 Plasma System, Chuck and Method of Making a Semiconductor Device
摘要 A chuck, a system including a chuck and a method for making a semiconductor device are disclosed. In one embodiment the chuck includes a first conductive region configured to be capacitively coupled to a first RF power generator, a second conductive region configured to be capacitively coupled to a second RF power generator and an insulation region that electrically insulates the first conductive region from the second conductive region.
申请公布号 US2014011356(A1) 申请公布日期 2014.01.09
申请号 US201213543701 申请日期 2012.07.06
申请人 ENGELHARDT MANFRED;INFINEON TECHNOLOGIES AG 发明人 ENGELHARDT MANFRED
分类号 H01L21/683;C23C16/509;H01L21/283;H01L21/3065;H01L21/31 主分类号 H01L21/683
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