发明名称 |
Plasma System, Chuck and Method of Making a Semiconductor Device |
摘要 |
A chuck, a system including a chuck and a method for making a semiconductor device are disclosed. In one embodiment the chuck includes a first conductive region configured to be capacitively coupled to a first RF power generator, a second conductive region configured to be capacitively coupled to a second RF power generator and an insulation region that electrically insulates the first conductive region from the second conductive region. |
申请公布号 |
US2014011356(A1) |
申请公布日期 |
2014.01.09 |
申请号 |
US201213543701 |
申请日期 |
2012.07.06 |
申请人 |
ENGELHARDT MANFRED;INFINEON TECHNOLOGIES AG |
发明人 |
ENGELHARDT MANFRED |
分类号 |
H01L21/683;C23C16/509;H01L21/283;H01L21/3065;H01L21/31 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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