| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive material excellent in environmental stabil ity, having high transparency to light of short wavelength and capable of forming a fine pattern having high adhesion to a substrate and satisfactory resolution by alkali development by incorporating an alkali-soluble resin having at least one of an alicyclic skeleton and a condensed polycyclic skeleton and a diazo compd. SOLUTION: This photosensitive material contains an alkali-soluble resin having at least one of an alicyclic skeleton and a condensed polycyclic skeleton and a diazo compd. A copolymer of acrylic acid with methacrylic acid, etc., may be used as the alkalisoluble resin. The diazo compd. may be represented by the formula (where each of R<1> and R<2> is H, 1-20C optionally substd. alkyl, optionally substd. aryl, etc.). |
