| 摘要 |
PROBLEM TO BE SOLVED: To improve the pattern accuracy by providing a double polyimide film composed of a nonphotosensitive polyimide film on a base and photosensitive polyimide film thereon. SOLUTION: An Al base layer 2 is formed on a part of a substrate 1 by sputtering with a mask. The substrate 1 is mounted on a spin coater to coat a nonphotosensitive polyimide film at a specified rotation speed for a specified time, heated on a hot plate and cooled down to form a nonphotosensitive polyimide film 3. The substrate 1 is again mounted on the spin coater to coat a photosensitive polyimide film at a specified rotation speed for a specified time, heated on the hot plate and cooled down to form a photosensitive polyimide film 4, thus forming a double layer. This suppresses the cracking to improve the pattern accuracy. |
