发明名称 DEPOSITION METHOD
摘要 In a simplified configuration, provided is a film formation method for easily depositing fine particles of a relatively large particle diameter on a basic material. According to an embodiment of the present invention, the method comprises the following steps: fine particles having a coating layer, which is easier to be electrified than a basic material, in a surface of the basic material are accommodated in a sealed container; an aerosol of the fine particles is generated by introducing gas to the sealed container; the fine particles are electrified by friction with the inner surface of a return pipe through the return pipe having a nozzle in a leading end connected to the sealed container; the aerosol is returned to a film formation chamber which maintains a lower pressure than the sealed container; and the fine particles, which are electrified to the basic material accommodated in the film formation chamber, are deposited since the nozzle sprays the aerosol.
申请公布号 KR20140003336(A) 申请公布日期 2014.01.09
申请号 KR20130074205 申请日期 2013.06.27
申请人 FUCHITA NANOTECHNOLOGY LTD.;NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY 发明人 FUCHITA EIJI;IRIYAMA YASUTOSHI
分类号 C23C24/04 主分类号 C23C24/04
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