发明名称 MOLDED PLASTIC WITH VAPOR-DEPOSITED FILM AND PROCESS FOR PRODUCING THE SAME
摘要 <p>A plastic formed article comprising a plastic substrate and a vapor deposited film formed on the surface of the plastic substrate by a plasma CVD method, wherein the vapor deposited film includes an organometal vapor deposited layer having an element ratio C/Si of 2.5 to 13 and an element ratio O/M of not larger than 0.5, and a hydrocarbon vapor deposited layer; and the hydrocarbon vapor deposited layer has a thickness in a range of 40 to 180 nm, exhibits peaks stemming from CH, CH 2 and CH 3 over a region of wave numbers of 3200 to 2600 cm -1 as measured by FT-IR, and has a CH 2 ratio of not larger than 35% and a CH 3 ratio of not less than 40%. A film is deposited on a plastic formed article without deteriorated by oxidation, without thermally deformed or without thermally deteriorated not only when PET or polyolefin is used but also when polylactic acid is used as the plastic substrate.</p>
申请公布号 EP2135734(B1) 申请公布日期 2014.01.08
申请号 EP20070791784 申请日期 2007.07.26
申请人 TOYO SEIKAN KAISHA, LTD. 发明人 ITO, TAKUROU;MORI, HIROKI;NAKAO, HIROSHI;YAMAZAKI, KAZUHIKO
分类号 B32B9/00;B65D23/08;C23C16/30 主分类号 B32B9/00
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