COPPER-TITANIUM ALLOY SPUTTERING TARGET, SEMICONDUCTOR WIRING LINE FORMED USING THE SPUTTERING TARGET, AND SEMICONDUCTOR ELEMENT AND DEVICE EACH EQUIPPED WITH THE SEMICONDUCTOR WIRING LINE

摘要

A copper-titanium alloy sputtering target comprising 3 at% or more and less than 15 at% of Ti and a remainder made up of Cu and unavoidable impurities, wherein a variation (standard deviation) in hardness is within 5.0 and a variation (standard deviation) in electric resistance is within 1.0 in an in-plane direction of the target. Provided are: a sputtering target for forming a copper-titanium alloy wiring line for semiconductors capable of causing the copper alloy wiring line for semiconductors to be equipped with a self-diffusion suppressive function, effectively preventing contamination around the wiring line caused by diffusion of active Cu, improving electromigration (EM) resistance, corrosion resistance and the like, enabling the arbitrary formation of a barrier layer in a simple manner, and uniformizing film properties; a copper-titanium alloy wiring line for semiconductors; and a semiconductor element and a device each equipped with the semiconductor wiring line.