TREATING LIQUID AFTER ASHING AND TREATING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To improve the removing property of residues produced by dry etching and ashing treatment under severer conditions and to improve the corrosion preventing effect for a substrate. SOLUTION: A treating liquid after ashing contains 0.5 to 10 wt.% lower alkyl quaternary ammonium salts and 1 to 50 wt.% polyhydric alcohols. In a treatment method using this treating liquid, after a substrate is treated by etching and ashing through making a photoresist pattern as a mask provided on the substrate, the substrate is treated by applying the treating liquid.