SUBSTRATE PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing device wherein a substrate is processed evenly with a processor liquid adjusted to a specified temperature while the footprint is reduced and the cost is decreased. SOLUTION: A developing device comprises a device main body part 100 and a separate cabinet 200. The device main body part 100 comprises a process part 1 and a relay box 10. The separate cabinet 200 comprises a temperature adjuster 20, temperature-adjustment cluster box 30, and developer liquid buffer tank 70. The temperature-adjustment cluster box 30 of the separate cabinet 200 and the relay box 10 of the device main body part 100 are connected together with a double piping 63. The double piping 63 has a double structure comprising an inside developer liquid piping 43 and outside constant-temperature water piping 53. The relay box 10 is connected to a developer liquid discharge nozzle 4 of the process part l through a double piping 60.