TEMPLATE, SURFACE PROCESSING METHOD OF TEMPLATE, SURFACE PROCESSING APPARATUS OF TEMPLATE, AND PATTERN FORMATION METHOD

摘要

A template includes a transfer surface having an unevenness pattern. The template is configured to form a configuration in a surface of a resin to reflect the unevenness pattern. The resin is formed by filling a photocurable resin liquid into a recess of the unevenness pattern in a state prior to using light to cure the photocurable resin liquid and by using the light to cure the photocurable resin liquid. The template includes a base member and a surface layer. The base member includes a major surface having an unevenness. The surface layer covers the unevenness of the base member, and is used to form the unevenness pattern to reflect a configuration of the unevenness. A contact angle between the surface layer and the photocurable resin liquid in the state prior to using the light to cure the photocurable resin liquid is not more than 30 degrees.