EXPOSURE APPARATUS AND EXPOSURE METHOD

摘要

A light exposure device according to an embodiment of the present invention comprises: an input section which obtains the image data about an aligning mark of a substrate; a design data storage section which stores design data about a location of a light exposure location of the substrate; a coordinate data generating section which generates a coordinate data corresponding to the aligning mark by using the image data which is obtained from the input section; a virtual divided section which forms virtual area by using the coordinate data of the coordinate data generating section, dividing the virtual area diagonally, and forming a divided virtual area respectively; a model correcting section which forms modeling data by performing a model correction about the respectively divided virtual area from the virtual divided section; a light exposure data generating section which generates light exposure data which is light exposure location changing value by using the design data of the design data storage section and the modeling data of the model correcting section; a light exposure section which performs light exposure by using the light exposure data of the light exposure data generating section and the design data of the design data storage section. [Reference numerals] (110) Input unit; (120) Coordinate data generating section; (130) Virtual divided section; (140) Model correcting section; (150) Design data storage section; (160) Light exposure data generating section; (170) Light exposure section