发明名称 ULTRAVIOLET BAKE EQUIPMENT CAPABLE OF FLOWING PHOTORESIST
摘要 PURPOSE: Provided is ultraviolet bake equipment capable of flowing photoresist which can progress a process that bakes photoresist by UV and flows photoresist in the same equipment. CONSTITUTION: The ultraviolet bake equipment contains i) a hot plate; ii) a heating coil that is installed at the inside to control the temperature of the hot plate; iii) a cooling pass that is installed at the lower side of the heating coil; and iv) a pin for maintaining distance that is able to maintain distance with a wafer that is installed at the upside surface of the hot plate.
申请公布号 KR20010010305(A) 申请公布日期 2001.02.05
申请号 KR19990029111 申请日期 1999.07.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUNG, GYU CHAN;KWAK, GYU HWAN
分类号 G03F7/16 主分类号 G03F7/16
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