发明名称 Self-aligned protection layer for copper post structure
摘要 A semiconductor device includes a semiconductor substrate and a conductive post overlying and electrically connected to the substrate. The semiconductor device further includes a manganese-containing protection layer on a surface of the conductive post. The semiconductor device further includes a cap layer over a top surface of the conductive post. A method of forming a semiconductor device includes forming a bond pad region on a semiconductor substrate. The method further includes forming a conductive post overlying and electrically connected to the bond pad region. The method further includes forming a protection layer on a surface of the conductive post, wherein the protection layer comprises manganese (Mn). The method further includes forming a cap layer on a top surface of the conductive post.
申请公布号 US8623755(B2) 申请公布日期 2014.01.07
申请号 US201313941984 申请日期 2013.07.15
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 LIU CHUNG-SHI;YU CHEN-HUA
分类号 H01L21/44 主分类号 H01L21/44
代理机构 代理人
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