| 摘要 |
An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of the projection optical system, exposes the substrate, the exposure apparatus includes: a liquid supply mechanism that supplies the liquid onto the substrate; a liquid recovery mechanism that recovers the liquid having been supplied on the substrate; and wherein when the exposure light is being irradiated on the image plane side of the projection optical system, the liquid recovery mechanism does not perform the recover of the liquid. |
