发明名称 |
Ultraviolet activated antimicrobial surfaces |
摘要 |
The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultraviolet light significantly improves the antimicrobial properties of the deposited coatings. |
申请公布号 |
US8623446(B2) |
申请公布日期 |
2014.01.07 |
申请号 |
US20060542531 |
申请日期 |
2006.10.03 |
申请人 |
MCGRATH TERRENCE S.;SEWELL DEIDRE;STOREY DANIEL M.;METASCAPE LLC |
发明人 |
MCGRATH TERRENCE S.;SEWELL DEIDRE;STOREY DANIEL M. |
分类号 |
A61L33/00;A61F2/02 |
主分类号 |
A61L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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