发明名称 Ultraviolet activated antimicrobial surfaces
摘要 The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultraviolet light significantly improves the antimicrobial properties of the deposited coatings.
申请公布号 US8623446(B2) 申请公布日期 2014.01.07
申请号 US20060542531 申请日期 2006.10.03
申请人 MCGRATH TERRENCE S.;SEWELL DEIDRE;STOREY DANIEL M.;METASCAPE LLC 发明人 MCGRATH TERRENCE S.;SEWELL DEIDRE;STOREY DANIEL M.
分类号 A61L33/00;A61F2/02 主分类号 A61L33/00
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