发明名称 Method for manufacturing solar cell including etching
摘要 A method for manufacturing a solar cell is presented. The method includes: forming an amorphous silicon layer on a first surface of a light absorbing layer; doping the amorphous silicon layer with a dopant; forming a dopant layer by diffusing the dopant into the amorphous silicon layer with a laser; forming a semiconductor layer by removing the dopant that remains outside the dopant layer; etching the surface of the semiconductor layer by using an etchant; forming a first electrode on the semiconductor layer; and forming a second electrode on a second surface of the light absorbing layer.
申请公布号 US8623692(B2) 申请公布日期 2014.01.07
申请号 US201113276044 申请日期 2011.10.18
申请人 KIM MYUNG SU;SONG MIN CHUL;PARK SOON YOUNG;KIM DONG SEOP;PARK SUNG CHAN;KANG YOON MOOK;KIM TAE JUN;SHIN MIN KI;LEE SANG WON;LIM HEUNG KYOON;SAMSUNG SDI CO., LTD. 发明人 KIM MYUNG SU;SONG MIN CHUL;PARK SOON YOUNG;KIM DONG SEOP;PARK SUNG CHAN;KANG YOON MOOK;KIM TAE JUN;SHIN MIN KI;LEE SANG WON;LIM HEUNG KYOON
分类号 H01L21/00 主分类号 H01L21/00
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