| 发明名称 |
Lithographic apparatus, projection system and damper for use in a lithographic apparatus and device manufacturing method |
| 摘要 |
In a lithographic apparatus, dampers are provided that may be used within mounts for optical elements in order to damp the motion of the optical element relative to the component to which it is mounted. |
| 申请公布号 |
US8625070(B2) |
申请公布日期 |
2014.01.07 |
| 申请号 |
US20080258689 |
申请日期 |
2008.10.27 |
| 申请人 |
FARNSWORTH WINDY LYNN;DEL PUERTO SANTIAGO E.;NAYFEH SAMIR A.;ASML HOLDING N.V. |
发明人 |
FARNSWORTH WINDY LYNN;DEL PUERTO SANTIAGO E.;NAYFEH SAMIR A. |
| 分类号 |
G03B27/42;G03B27/54 |
主分类号 |
G03B27/42 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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