发明名称 |
Device for supporting a rotatable target and sputtering apparatus |
摘要 |
It is provided a device for supporting a rotatable target of a deposition apparatus for sputtering material onto a substrate, wherein the device includes a drive unit for rotating the rotatable target; a ring-shaped part connected to the drive unit for attaching the drive unit to the rotatable target; and, a shield for covering the ring-shaped part. The shield is adapted for rotating together with the ring-shaped part and includes a plurality of parts assembled together. Furthermore, a sputtering apparatus and a method for supporting a rotatable target are provided. |
申请公布号 |
US8623184(B2) |
申请公布日期 |
2014.01.07 |
申请号 |
US201113019843 |
申请日期 |
2011.02.02 |
申请人 |
SCHNAPPENBERGER FRANK;MULTERER JUERGEN;APPLIED MATERIALS, INC. |
发明人 |
SCHNAPPENBERGER FRANK;MULTERER JUERGEN |
分类号 |
C23C14/00 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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