发明名称 Side-gate defined tunable nanoconstriction in double-gated graphene multilayers
摘要 A graphene-based electrically tunable nanoconstriction device and a non-transitory tangible computer readable medium encoded with a program for fabricating the device that includes a back-gate dielectric layer over a conductive substrate are described. The back-gate dielectric layer may be hexagonal boron nitride, mica, SiOx, SiNx, BNx, HfOx or AlOx. A graphene layer is an AB-stacked bi-layer graphene layer, an ABC-stacked tri-layer graphene layer or a stacked few-layer graphene layer. Contacts formed over a portion of the graphene layer include at least one source contact, at least one drain contact and at least one set of side-gate contacts. A graphene channel with graphene side gates is formed in the graphene layer between at least one source contact, at least one the drain contact and at least one set of side-gate contacts. A top-gate dielectric layer is formed over the graphene layer. A top-gate electrode is formed on the top-gate dielectric layer.
申请公布号 US8624223(B2) 申请公布日期 2014.01.07
申请号 US201213668401 申请日期 2012.11.05
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHEN CHING-TZU;HAN SHU-JEN
分类号 H01L29/06;H01L31/00 主分类号 H01L29/06
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