| 摘要 |
An exposure apparatus including an optical system, includes a light shielding plate, a rotational drive unit configured to rotatably drive the light shielding plate around an axis of rotation along an optical path in the optical system, a shift drive unit configured to shift-drive the light shielding plate in a direction intersecting the axis of rotation, an acquisition unit configured to acquire information relating to a relative position between a reference axis serving as a reference when a pattern image is projected on a substrate by the optical system and the axis of rotation, and a control unit configured to control the rotational drive unit and the shift-drive unit so that, when projecting the pattern image on a circumferential portion near an outer edge of the substrate, the light shielding plate is positioned at a predetermined position based on the information relating to the relative position. |
